Inventor

Sho IWASA

Inventor
JP

Overview

5→
Patents
2025–2026
Patent span
Physics
Primary field (CPC G)

Patents· 5 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G01Nprimary
G01NInvestigating or analysing materials by determining their chemical or physical properties56%
F04BPositive-displacement machines for liquids33%
B01DSeparation11%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2025–2026Patents assigned to HITACHI HIGH TECH CORP (5)· patent assignee history
2025–2026Based in JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
HITACHI HIGH TECH CORP52025–2026
Locations
LocationPatentsSpan
JP52025–2026