Inventor
Dong Seon Uh
Inventor
Uiwang-si, KR
Overview
Patents· 39 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C09Jprimary
C09JAdhesives12%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices11%
H01BCables10%
C08LCompositions of macromolecular compounds9%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds7%
H01LSemiconductor devices6%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h106%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients5%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h105%
C09KMaterials for miscellaneous applications, not provided for elsewhere4%
PatentTitleYear
10,141,084Electronic device20189,589,696'Semiconductor device using composition for anisotropic conductive adhesive film or anisotropic conductive adhesive film'20179,540,549'Anisotropic conductive film and semiconductor device bonded by the same'20179,534,154'Semiconductor device using composition for anisotropic conductive adhesive film or anisotropic conductive adhesive film'20179,390,831'Electronic device using anisotropic conductive composition and film'20169,389,338'Optical member comprising anisotropic conductive film'20169,384,869'Anisotropic conductive film, composition for the same, and apparatus including the same'20169,281,097'Anisotropic conductive film, composition for the same, and apparatus including the same'20169,263,372'Anisotropic conductive film and semiconductor device'20169,173,303'Anisotropic conductive film and apparatus including the same'20159,109,147'Adhesive composition for semiconductor and adhesive film comprising the same'20159,048,240'Anisotropic conductive film and electronic device including the same'20159,035,192'Anisotropic conductive adhesive composite and film, and circuit connecting structure including the same'20158,916,329'Hardmask composition and associated methods'20148,896,117'Semiconductor device bonded by an anisotropic conductive film'20148,766,443'Anisotropic conductive film composition, anisotropic conductive film, and semiconductor device bonded by the same'20148,722,158'Liquid crystal photo-alignment agent and liquid crystal photo-alignment film manufactured using the same'20148,608,985'Anisotropic conductive film, composition for the same, and apparatus including the same'20138,445,187'Hardmask composition having antireflective properties and method of patterning material on substrate using the same'20138,425,799'Photoalignment agent of liquid crystal, photoalignment film of liquid crystal including the same, and liquid crystal display including the same'20138,420,289'Aromatic ring-containing polymer, polymer mixture, antireflective hardmask composition, and associated methods'20138,383,737'Compound for gap-filling of semiconductor device and coating composition using the same'20138,329,264'Liquid crystal alignment agent, and liquid crystal alignment film and liquid crystal display including same'20128,299,197'Organosilane polymer with improved gap-filling property for semiconductor device and coating composition using the same'20128,273,519'Hardmask composition and associated methods'20128,263,321'Polymer having antireflective properties and high carbon content, hardmask composition including the same, and process for forming a patterned material layer'20128,088,301'Epoxy compound for liquid crystal photo-alignment agent, liquid crystal photo-alignment agent, and liquid crystal photo-alignment film'20128,057,700'Liquid crystal photo-alignment agent and liquid crystal photo-alignment film and liquid crystal display including the same'20118,034,261'Anisotropic conductive film composition, anisotropic conductive film including the same, and associated methods'20117,981,594'Hardmask composition having antirelective properties and method of patterning material on susbstrate using the same'20117,879,526'Hardmask compositions for resist underlayer films'20117,862,990'Polymer having antireflective properties and high carbon content, hardmask composition including the same, and process for forming a patterned material layer'20117,829,638'Antireflective hardmask composition and methods for using same'20107,659,051'Polymer having antireflective properties, hardmask composition including the same, and process for forming a patterned material layer'20107,655,386'Polymer having antireflective properties, hardmask composition including the same, process for forming a patterned material layer, and associated device'20107,629,260'Organosilane hardmask compositions and methods of producing semiconductor devices using the same'20097,514,199'Hardmask compositions for resist underlayer film and method for producing semiconductor integrated circuit device using the same'20097,405,029'Antireflective hardmask composition and methods for using same'20087,378,217'Antireflective hardmask composition and methods for using same'2008Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2008–2018Patents assigned to CHEIL IND INC (39)· patent assignee history
2008–2014Based in Seoul, KR· patent location history
2011–2018Based in Uiwang-si, KR· patent location history
2012–2018Patents assigned to UH DONG SEON (23)· patent assignee history
2012–2014Patents assigned to KIM JONG SEOB (6)· patent assignee history
2013–2018Patents assigned to PARK JIN SEONG (7)· patent assignee history
2013Based in Gyeonggi-do, KR· patent location history
2014–2018Patents assigned to PARK KYOUNG SOO (6)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| CHEIL IND INC | 39 | 2008–2018 |
| UH DONG SEONself | 23 | 2012–2018 |
| PARK JIN SEONG | 7 | 2013–2018 |
| KIM JONG SEOB | 6 | 2012–2014 |
| PARK KYOUNG SOO | 6 | 2014–2018 |
Locations
| Location | Patents | Span |
|---|---|---|
| Uiwang-si, KR | 21 | 2011–2018 |
| Seoul, KR | 17 | 2008–2014 |
| Gyeonggi-do, KR | 1 | 2013 |