LexDanaLexDanabeta
Inventor

Hauke BENSCH

Inventor
DE

Overview

2→
Patents
2024–2026
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G05Bprimary
G05BControl or regulating systems in general25%
B05DProcesses for applying fluent materials to surfaces, in general13%
C25DProcesses for the electrolytic or electrophoretic production of coatings13%
G06FElectric digital data processing13%
G06NComputing arrangements based on specific computational models13%
G06QInformation and communication technology [ict] specially adapted for administrative, commercial, financial, managerial or supervisory purposes13%
Y02PClimate change mitigation technologies in the production or processing of goods13%
PatentTitleYear
12,517,504Analysis method and devices for same202611,927,946Analysis method and devices for same2024

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2024–2026Patents assigned to DUERR SYSTEMS AG (2)· patent assignee history
2024–2026Based in DE· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
DUERR SYSTEMS AG22024–2026
Locations
LocationPatentsSpan
DE22024–2026