Inventor

Akimasa Soyano

Inventor

Tokyo, JP

Overview

2003–2016

Patent span

Chemistry

Primary field (CPC C)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%

C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds17%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests17%

C07CAcyclic or carbocyclic compounds6%

C07DHeterocyclic compounds6%

C08LCompositions of macromolecular compounds6%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2003–2016Patents assigned to JSR CORP (6)· patent assignee history

2003–2016Based in Tokyo, JP· patent location history

2004–2009Based in Mie, JP· patent location history

2013–2016Patents assigned to SOYANO AKIMASA (2)· patent assignee history

2013Patents assigned to MATSUMURA NOBUJI (1)· patent assignee history

2016Patents assigned to ASANO YUSUKE (1)· patent assignee history

2016Patents assigned to ISHII TAKESHI (1)· patent assignee history

Assignee and location history derived from the patent record.

Assignees

Locations

Location	Patents	Span
Tokyo, JP	4	2003–2016
Mie, JP	2	2004–2009