Inventor
Ramin Emami
Inventor
San Jose, CA, US
Overview
Patents· 21 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
B24Bprimary
B24BMachines, devices, or processes for grinding or polishing29%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1029%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1011%
B24DTools for grinding, buffing or sharpening7%
B08BCleaning in general4%
H10DInorganic electric semiconductor devices4%
B25BTools or bench devices not otherwise provided for, for fastening, connecting, disengaging, or holding2%
C11DDetergent compositions2%
C23CCoating metallic material2%
C23FNon-mechanical removal of metallic material from surface2%
PatentTitleYear
8,133,096'Multi-phase polishing pad'20127,497,767'Vibration damping during chemical mechanical polishing'20097,331,847'Vibration damping in chemical mechanical polishing system'20087,273,813'Wafer cleaning solution for cobalt electroless application'20077,256,111'Pretreatment for electroless deposition'20077,104,267'Planarized copper cleaning for reduced defects'20067,041,599'High through-put Cu CMP with significantly reduced erosion and dishing'20067,014,545'Vibration damping in a chemical mechanical polishing system'20067,014,538'Article for polishing semiconductor substrates'20066,857,941'Multi-phase polishing pad'20056,832,948'Thermal preconditioning fixed abrasive articles'20046,786,996'Apparatus and method for edge bead removal'20046,708,701'Capillary ring'20046,676,497'Vibration damping in a chemical mechanical polishing system'20046,669,538'Pad cleaning for a CMP system'20036,656,842'Barrier layer buffing after Cu CMP'20036,592,439'Platen for retaining polishing material'20036,432,826'Planarized Cu cleaning for reduced defects'20026,413,873'System for chemical mechanical planarization'20026,322,427'Conditioning fixed abrasive articles'20016,299,698'Wafer edge scrubber and method'2001Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2001–2012Patents assigned to APPLIED MATERIALS INC (21)· patent assignee history
2001–2012Based in San Jose, CA, US· patent location history
2001Based in Sunnyvale, CA, US· patent location history
2012Patents assigned to EMAMI RAMIN (1)· patent assignee history
2012Patents assigned to LUM ROBERT (1)· patent assignee history
2012Patents assigned to MISHRA SOURABH (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 21 | 2001–2012 |
| EMAMI RAMINself | 1 | 2012 |
| LUM ROBERT | 1 | 2012 |
| MISHRA SOURABH | 1 | 2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| San Jose, California, US | 20 | 2001–2012 |
| Sunnyvale, California, US | 1 | 2001 |