Inventor

Maxim S. Shatalov

Inventor
Columbia, SC, US

Overview

148→
Patents
2013–2021
Patent span
Electricity
Primary field (CPC H)

Patents· 148 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Hprimary
H10HInorganic light-emitting semiconductor devices having potential barriers20%
H01LSemiconductor devices20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%
H10DInorganic electric semiconductor devices8%
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light5%
A61LMethods or apparatus for sterilising materials or objects in general4%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h104%
B82YSpecific uses or applications of nanostructures3%
F25DRefrigerators3%
G06FElectric digital data processing2%
PatentTitleYear
11,063,178Semiconductor heterostructure with improved light emission202111,027,319Illumination using multiple light sources202110,950,747Heterostructure for an optoelectronic device202110,923,623Semiconductor layer including compositional inhomogeneities202110,923,619Semiconductor heterostructure with at least one stress control layer202110,907,055Curing ultraviolet sensitive polymer materials202110,903,391Optoelectronic device with modulation doping202110,881,755Ultraviolet illumination with optical elements202110,849,996Storage device including ultraviolet illumination202010,854,785Contact configuration for optoelectronic device202010,842,081Controlling light exposure of light sensitive object202010,804,423Optoelectronic device with modulation doping202010,788,186Illumination with blue UV light source and visible light source202010,787,375Ultraviolet water disinfection system202010,770,616Heterostructure with sacrificial layer202010,751,663Ultraviolet treatment of volatile organic compounds202010,707,379Configuration for optoelectronic device202010,688,210Storage device including ultraviolet illumination202010,624,978Ultraviolet-based mildew control202010,629,770Semiconductor method having annealing of epitaxially grown layers to form semiconductor structure with low dislocation density202010,622,515Patterned layer design for group III nitride layer growth202010,615,307Semiconductor structure with inhomogeneous regions202010,598,468Simulation of missile signatures202010,576,174Ultraviolet gradient sterilization, disinfection, and storage system202010,535,793Group III nitride heterostructure for optoelectronic device202010,517,976Ultraviolet system for disinfection201910,522,714Device with inverted large scale light extraction structures201910,497,829Semiconductor material doping201910,497,824Light emitting heterostructure with partially relaxed semiconductor layer201910,490,697Epitaxy technique for growing semiconductor compounds201910,490,713Ultraviolet device encapsulant201910,478,515Multi wave sterilization system201910,460,952Stress relieving semiconductor layer201910,454,006Heterostructure including anodic aluminum oxide layer201910,441,670Storage device including ultraviolet illumination201910,433,493Controlling ultraviolet intensity over a surface of a light sensitive object201910,411,156Device with transparent and higher conductive regions in lateral cross section of semiconductor layer201910,383,964Storage device including ultraviolet illumination201910,347,793Metallic contact for optoelectronic semiconductor device201910,319,881Device including transparent layer with profiled surface for improved extraction201910,297,460Stress relieving semiconductor layer201910,276,749Ultraviolet reflective rough adhesive contact201910,272,168Storage device including target UV illumination ranges201910,243,100Semiconductor layer including compositional inhomogeneities201910,224,456Deep ultraviolet light emitting diode201910,224,408Perforating contact to semiconductor layer201910,211,048Epitaxy technique for reducing threading dislocations in stressed semiconductor compounds201910,199,535Semiconductor structure with stress-reducing buffer structure201910,199,531Semiconductor heterostructure with stress management201910,199,537Semiconductor structure with stress-reducing buffer structure201910,199,536Patterned layer design for group III nitride layer growth201910,181,398Strain-control heterostructure growth201910,177,534Electron beam pumping for light emission201910,178,726Solid-state lighting structure with integrated control201910,172,968Storage device including target UV illumination ranges201910,164,147Non-uniform superlattice structure201810,158,044Epitaxy technique for growing semiconductor compounds201810,153,396Patterned layer design for group III nitride layer growth201810,147,854Packaging for ultraviolet optoelectronic device201810,147,848Contact configuration for optoelectronic device201810,096,742Light emitting device substrate with inclined sidewalls201810,090,210Material growth with temperature controlled layer201810,069,034Optoelectronic device with modulation doping201810,050,174Device with transparent and higher conductive regions in lateral cross section of semiconductor layer201810,050,172Substrate structure removal201810,050,175Patterned layer design for group III nitride layer growth201810,032,956Patterned substrate design for layer growth20189,999,782Ultraviolet-based sterilization20189,997,667Semiconductor material doping20189,981,051Ultraviolet gradient sterilization, disinfection, and storage system20189,966,496Light emitting heterostructure with partially relaxed semiconductor layer20189,960,315Light emitting heterostructure with partially relaxed semiconductor layer20189,923,118'Semiconductor structure with inhomogeneous regions'20189,919,068'Storage device including ultraviolet illumination'20189,923,117'Semiconductor structure with inhomogeneous regions'20189,911,895'Semiconductor structure with inhomogeneous regions'20189,911,900'Device including transparent layer with profiled surface for improved extraction'20189,894,723'Solid-state lighting structure with integrated control'20189,878,061'Ultraviolet system for disinfection'20189,876,140Semiconductor structure with stress-reducing buffer structure20189,831,382Epitaxy technique for growing semiconductor compounds20179,818,826'Heterostructure including a composite semiconductor layer'20179,818,912'Ultraviolet reflective contact'20179,806,226'Deep ultraviolet light emitting diode'20179,806,228'Patterned layer design for group III nitride layer growth'20179,795,699'Storage device including target UV illumination ranges'20179,799,793'Semiconductor heterostructure with stress management'20179,793,439'Metallic contact for optoelectronic semiconductor device'20179,768,357'Ultraviolet reflective rough adhesive contact'20179,750,830'Multi wave sterilization system'20179,748,440'Semiconductor layer including compositional inhomogeneities'20179,741,899'Device with inverted large scale light extraction structures'20179,735,315'Semiconductor heterostructure with stress management'20179,724,441'Storage device including target UV illumination ranges'20179,722,139'Non-uniform multiple quantum well structure'20179,707,307'Ultraviolet system for disinfection'20179,691,939'Patterned layer design for group III nitride layer growth'20179,691,680'Structured substrate'20179,680,061'Patterned layer design for group III nitride layer growth'20179,660,043'Ohmic contact to semiconductor layer'20179,660,133'Group III nitride heterostructure for optoelectronic device'20179,653,631'Optoelectronic device with modulation doping'20179,653,313'Stress relieving semiconductor layer'20179,646,911'Composite substrate'20179,647,168'Optoelectronic device with modulation doping'20179,634,189'Patterned substrate design for layer growth'20179,634,183'Semiconductor material doping'20179,595,636'Light emitting device substrate with inclined sidewalls'20179,595,634'Device with transparent and higher conductive regions in lateral cross section of semiconductor layer'20179,562,171'Ultraviolet device encapsulant'20179,548,429'Packaging for ultraviolet optoelectronic device'20179,543,400'Ohmic contact to semiconductor'20179,537,054'Semiconductor heterostructure with stress management'20179,502,509'Stress relieving semiconductor layer'20169,437,774'Deep ultraviolet light emitting diode'20169,425,353'Heterostructure including anodic aluminum oxide layer'20169,412,902'Semiconductor structure with stress-reducing buffer structure'20169,406,840'Semiconductor layer including compositional inhomogeneities'20169,397,260'Patterned layer design for group III nitride layer growth'20169,385,271'Device with transparent and higher conductive regions in lateral cross section of semiconductor layer'20169,368,580'Semiconductor material doping'20169,337,387'Emitting device with improved extraction'20169,330,906'Stress relieving semiconductor layer'20169,331,244'Semiconductor structure with inhomogeneous regions'20169,324,560'Patterned substrate design for layer growth'20169,312,448'Metallic contact for optoelectronic semiconductor device'20169,312,428'Light emitting heterostructure with partially relaxed semiconductor layer'20169,287,449'Ultraviolet reflective rough adhesive contact'20169,287,442'Semiconductor material doping'20169,281,441'Semiconductor layer including compositional inhomogeneities'20169,269,788'Ohmic contact to semiconductor'20169,267,770'Light emitting diodes for simulation of missile signatures'20169,179,703'Ultraviolet system for disinfection'20159,184,346'Ultraviolet reflective contact'20159,184,339'Deep ultraviolet light emitting diode'20159,142,741'Emitting device with improved extraction'20159,105,792'Patterned layer design for group III nitride layer growth'20159,061,082'Ultraviolet-based sterilization'20159,048,378'Device with inverted large scale light extraction structures'20159,042,420'Device with transparent and higher conductive regions in lateral cross section of semiconductor layer'20159,034,271'Storage device including ultraviolet illumination'20158,981,403'Patterned substrate design for layer growth'20158,969,198'Ohmic contact to semiconductor layer'20158,927,959'Deep ultraviolet light emitting diode'20158,907,322'Deep ultraviolet light emitting diode'20148,879,598'Emitting device with compositional and doping inhomogeneities in semiconductor layers'20148,787,418'Emitting device with compositional and doping inhomogeneities in semiconductor layers'20148,426,225'Semiconductor material doping based on target valence band discontinuity'2013

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2013–2021Patents assigned to SENSOR ELECTRONIC TECH INC (147)· patent assignee history
2013–2016Patents assigned to GASKA REMIGIJUS (7)· patent assignee history
2013–2016Patents assigned to SHATALOV MAXIM S (7)· patent assignee history
2013–2016Patents assigned to SHUR MICHAEL (7)· patent assignee history
2013–2016Patents assigned to YANG JINWEI (4)· patent assignee history
2013–2021Based in Columbia, SC, US· patent location history
2020Based in Lexington, SC, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SENSOR ELECTRONIC TECH INC1472013–2021
GASKA REMIGIJUS72013–2016
SHATALOV MAXIM Sself72013–2016
SHUR MICHAEL72013–2016
YANG JINWEI42013–2016
Locations
LocationPatentsSpan
Columbia, SC, US1452013–2021
Lexington, SC, US32020