Inventor
Daijitsu Harada
Inventor
Joetsu-shi, JP
Overview
Patents· 27 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C03Cprimary
C03CChemical composition of glasses, glazes or vitreous enamels16%
B24BMachines, devices, or processes for grinding or polishing14%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h109%
C09KMaterials for miscellaneous applications, not provided for elsewhere7%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices7%
C09GPolishing compositions6%
C03BManufacture, shaping, or supplementary processes5%
Y10TTechnical subjects covered by former us classification4%
B82YSpecific uses or applications of nanostructures3%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium3%
PatentTitleYear
10,948,817Mold-forming substrate and inspection method202110,865,141Synthetic quartz glass lid precursor, synthetic quartz glass lid, and preparation methods thereof202010,865,139Large-size synthetic quartz glass substrate, evaluation method, and manufacturing method202010,829,411Rectangular glass substrate and method for preparing the same202010,756,239Synthetic quartz glass lid and optical device package202010,737,966Method for preparing synthetic quartz glass substrate202010,611,676Method for preparing synthetic quartz glass substrate202010,558,116Method for preparing synthetic quartz glass substrate202010,093,833Colloidal silica polishing composition and method for manufacturing synthetic quartz glass substrates using the same201810,086,493Method for producing substrates201810,065,285Method of preparing substrate20189,963,634Synthetic quartz glass substrate polishing slurry and manufacture of synthetic quartz glass substrate using the same20189,919,962'Polishing agent for synthetic quartz glass substrate'20189,731,396'Method of preparing synthetic quartz glass substrate'20179,616,542'Manufacture of synthetic quartz glass substrate'20179,598,305'Synthetic quartz glass substrate and making method'20179,505,166'Rectangular mold-forming substrate'20169,487,426'Heat treatment method of synthetic quartz glass'20169,316,902'Photomask-forming glass substrate and making method'20169,309,447'Method for recovery of cerium oxide'20169,090,502'Nanoimprint-mold release agent, surface treatment method, and nanoimprint mold'20158,927,754'Silazane compounds having fluoroalkyl group and method of preparing the same'20158,551,346'Photomask-forming glass substrate and making method'20138,536,359'Alkoxysilane compounds having fluoroalkyl group and method of preparing the same'20138,500,517'Preparation of synthetic quartz glass substrates'20138,360,824'Method of processing synthetic quartz glass substrate for semiconductor'20138,168,272'Storage container for photomask-forming synthetic quartz glass substrate'2012Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2012–2021Patents assigned to SHINETSU CHEMICAL CO (26)· patent assignee history
2012–2021Patents assigned to HARADA DAIJITSU (9)· patent assignee history
2012–2021Patents assigned to TAKEUCHI MASAKI (9)· patent assignee history
2012–2021Based in Joetsu-shi, JP· patent location history
2013–2015Patents assigned to HONMA TAKAYUKI (3)· patent assignee history
2013–2015Patents assigned to KIYOMORI AYUMU (3)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SHINETSU CHEMICAL CO | 26 | 2012–2021 |
| HARADA DAIJITSUself | 9 | 2012–2021 |
| TAKEUCHI MASAKI | 9 | 2012–2021 |
| HONMA TAKAYUKI | 3 | 2013–2015 |
| KIYOMORI AYUMU | 3 | 2013–2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Joetsu-shi, JP | 27 | 2012–2021 |