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Inventor

Yasuhisa Fujii

Inventor
Kyoto, JP

Overview

39→
Patents
1996–2019
Patent span
Performing operations
Primary field (CPC B)

Patents· 39 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

Y10Tprimary
Y10TTechnical subjects covered by former us classification14%
H03HImpedance networks, e.g. resonant circuits10%
B41JTypewriters9%
B01LChemical or physical laboratory apparatus for general use6%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h105%
B01DSeparation4%
F04BPositive-displacement machines for liquids4%
F15CFluid-circuit elements predominantly used for computing or control purposes4%
F16KValves4%
G06FElectric digital data processing4%
PatentTitleYear
10,261,411Pellicle film, pellicle frame, pellicle, and method for producing same20199,934,452Pruning and label selection in hidden Markov model-based OCR20189,672,448'Pruning and label selection in Hidden Markov Model-based OCR'20179,557,410'Radar reception device, radar apparatus and radar reception signal displaying method'20179,552,808'Decoding parameters for Viterbi search'20179,390,531'Movable body display device and movable body display method'20169,189,708'Pruning and label selection in hidden markov model-based OCR'20158,736,146'Electric power device, electric power generation method, and production method of electric power device'20148,680,599'Semiconductor device and method of manufacturing the same'20148,585,799'Air pre-treatment device'20138,444,396'Fluid transferring system and micropump suitable therefor'20137,898,145'Boundary acoustic wave device'20117,808,344'Boundary acoustic wave filter'20107,800,460'Elastic wave filter device and duplexer'20107,728,699'Acoustic wave filter'20107,682,138'Fluid transferring system and micropump suitable therefor'20107,647,032'Oscillation control device and synchronization system'20107,591,200'Method of detecting high-concentration region direction of pollutant in soil'20097,486,159'Surface acoustic wave device'20097,201,969'Pressure-sensitive adhesive film for the surface protection of semiconductor wafers and method for protection of semiconductor wafers with the film'20077,094,040'Fluid transferring system and micropump suitable therefor'20066,851,846'Mixing method, mixing structure, micromixer and microchip having the mixing structure'20056,838,055'Microchip'20056,835,313'Extracting method, structure and apparatus, and separating method, structure and apparatus'20046,822,180'Particle separation mechanism'20046,809,614'Surface acoustic wave device having balanced and unbalanced terminals and a delay line'20046,730,595'Protecting method for semiconductor wafer and surface protecting adhesive film for semiconductor wafer used in said method'20046,504,453'Transversal surface acoustic wave filter'20036,462,632'Composite saw filter with a saw filter and a withdrawal weighted or electrode reversed saw resonator'20026,371,599'Ink jet recording apparatus and drive unit and method for ink jet head'20026,338,550'Inkjet printing head with oval flexible cable configured to be received within oval hollow portion'20026,322,198'Electrostatic inkjet head having spaced electrodes'20016,309,056'Ink jet head, drive method of ink jet head, and ink jet recording apparatus'20016,273,791'Method of producing semiconductor wafer'20016,203,725'Luminescent compound for controlling traveling and method for controlling traveling using the same'20016,159,827'Preparation process of semiconductor wafer'20006,100,910'Thermal print head, method of manufacturing the same and method of adjusting heat generation thereof'20006,067,104'Thermal print head, method of manufacturing the same and method of adjusting heat generation thereof'20005,479,685'Method of producing ink jet print head'1996

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1996–2019Based in Kyoto, JP· patent location history
2000–2019Patents assigned to MITSUI CHEMICALS INC (6)· patent assignee history
2000–2001Based in Aichi, JP· patent location history
2001–2013Patents assigned to MINOLTA CO LTD (10)· patent assignee history
2002–2011Patents assigned to MURATA MANUFACTURING CO (8)· patent assignee history
2003–2011Based in Kanazawa, JP· patent location history
2013–2014Patents assigned to FUJII YASUHISA (4)· patent assignee history
2015–2018Patents assigned to GOOGLE INC (4)· patent assignee history
2015–2018Based in Sunnyvale, CA, US· patent location history
2016–2017Based in Nishinomiya, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
MINOLTA CO LTD102001–2013
MURATA MANUFACTURING CO82002–2011
MITSUI CHEMICALS INC62000–2019
FUJII YASUHISAself42013–2014
GOOGLE INC42015–2018
Locations
LocationPatentsSpan
Kyoto, JP191996–2019
Kanazawa, JP72003–2011
Sunnyvale, California, US42015–2018
Aichi, JP32000–2001
Nishinomiya, JP22016–2017