Inventor
Nobuyoshi Tanno
Inventor
Katta-gun, JP
Overview
Patents· 3 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1060%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices40%
PatentTitleYear
8,755,025'Substrate transport apparatus and method, exposure apparatus and exposure method, and device fabricating method'20147,898,645'Substrate transport apparatus and method, exposure apparatus and exposure method, and device fabricating method'20116,432,849'Substrate storage cassette positioning device and method'2002Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2002–2014Patents assigned to NIKON CORP (3)· patent assignee history
2002–2014Patents assigned to ZAO NIKON CO LTD (3)· patent assignee history
2002Based in Zao, JP· patent location history
2011Based in Miyagi, JP· patent location history
2014Patents assigned to HORIUCHI TAKASHI (1)· patent assignee history
2014Patents assigned to TANNO NOBUYOSHI (1)· patent assignee history
2014Based in Katta-gun, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NIKON CORP | 3 | 2002–2014 |
| ZAO NIKON CO LTD | 3 | 2002–2014 |
| HORIUCHI TAKASHI | 1 | 2014 |
| TANNO NOBUYOSHIself | 1 | 2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Katta-gun, JP | 1 | 2014 |
| Miyagi, JP | 1 | 2011 |
| Zao, JP | 1 | 2002 |