Inventor
AKITAKA SHIMIZU
Inventor
JP
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps25%
H01LSemiconductor devices25%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
B82YSpecific uses or applications of nanostructures4%
C23CCoating metallic material4%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices4%
H05HPlasma technique4%
H10DInorganic electric semiconductor devices4%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h104%
PatentTitleYear
12,500,091Etching method, method of removing etching residue, and storage medium202512,237,173Substrate processing method, substrate processing apparatus and substrate processing system202512,165,848Substrate processing method, substrate processing apparatus, and method for producing nanowire or nanosheet transistor202411,557,486Etching method, damage layer removal method, and storage medium202311,443,952Etching method and etching device202211,328,904Substrate processing apparatus2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2025Patents assigned to TOKYO ELECTRON LTD (6)· patent assignee history
2022–2025Based in JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 6 | 2022–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 6 | 2022–2025 |