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Inventor

Ralf Hilgers

Inventor
Aalen, DE

Overview

3→
Patents
2001–2007
Patent span
Physics
Primary field (CPC G)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G02Bprimary
G02BOptical elements, systems or apparatus60%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices40%
PatentTitleYear
7,274,430'Optical arrangement and projection exposure system for microlithography with passive thermal compensation'20076,392,825'Assembly comprising an optical element and a mount'20026,191,898'Optical imaging device, particularly an objective, with at least one optical element'2001

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2001–2002Patents assigned to ZEISS STIFTUNG (2)· patent assignee history
2001–2002Based in Aalen, DE· patent location history
2007Patents assigned to ZEISS CARL SMT AG (1)· patent assignee history
2007Based in Hamburg, DE· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ZEISS STIFTUNG22001–2002
ZEISS CARL SMT AG12007
Locations
LocationPatentsSpan
Aalen, DE22001–2002
Hamburg, DE12007