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Inventor

Rene Hubert Jacobus Carpaij

Inventor
Vught, NL

Overview

3→
Patents
2005–2014
Patent span
Physics
Primary field (CPC G)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices75%
G01NInvestigating or analysing materials by determining their chemical or physical properties25%
PatentTitleYear
8,773,657'Method to determine the value of process parameters based on scatterometry data'20147,199,861'Lithographic apparatus and device manufacturing method'20076,960,775'Lithographic apparatus, device manufacturing method and device manufactured thereby'2005

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2005–2014Patents assigned to ASML NETHERLANDS BV (3)· patent assignee history
2005–2014Based in Vught, NL· patent location history
2014Patents assigned to CARPAIJ RENE HUBERT JACOBUS (1)· patent assignee history
2014Patents assigned to CRAMER HUGO AUGUSTINUS JOSEPH (1)· patent assignee history
2014Patents assigned to KIERS ANTOINE GASTON MARIE (1)· patent assignee history
2014Patents assigned to VAN DER LAAN HANS (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV32005–2014
CARPAIJ RENE HUBERT JACOBUSself12014
CRAMER HUGO AUGUSTINUS JOSEPH12014
KIERS ANTOINE GASTON MARIE12014
VAN DER LAAN HANS12014
Locations
LocationPatentsSpan
Vught, NL32005–2014