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Inventor

MASARU TAKESHITA

Inventor
JP

Overview

1→
Patents
2024
Patent span
Chemistry
Primary field (CPC C)

Patents· 1 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C08Gprimary
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds50%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
PatentTitleYear
12,099,298Resist composition and method of forming resist pattern2024

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2024Patents assigned to TOKYO OHKA KOGYO CO LTD (1)· patent assignee history
2024Based in JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOKYO OHKA KOGYO CO LTD12024
Locations
LocationPatentsSpan
JP12024