Inventor

Mingqi Li

Inventor

Shrewsbury, MA, US

Overview

2005–2021

Patent span

Chemistry

Primary field (CPC C)

Patents· 72 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices19%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%

C09DCoating compositions, e.g. paints, varnishes or lacquers9%

H01LSemiconductor devices8%

C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds7%

C07CAcyclic or carbocyclic compounds6%

C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds5%

C08LCompositions of macromolecular compounds5%

C07DHeterocyclic compounds5%

H10DInorganic electric semiconductor devices3%

PatentTitleYear

10,992,386Method for implementing variable optical splitter and variable optical splitter2021 10,985,860Method for managing multi-wavelength passive optical network, and optical module2021 10,887,160Management method for home network device and network management system2021 10,809,616Cholate photoacid generators and photoresists comprising same2020 10,719,014Photoresists comprising amide component2020 10,684,549Pattern-formation methods2020 10,670,965Polymers and photoresist compositions2020 10,578,969Photoresist topcoat compositions and methods of processing photoresist compositions2020 10,481,495Topcoat compositions containing fluorinated thermal acid generators2019 10,287,455Methods for manufacturing block copolymers and articles manufactured therefrom2019 10,241,411Topcoat compositions containing fluorinated thermal acid generators2019 10,241,407Thermal acid generators and photoresist pattern trimming compositions and methods2019 10,197,918Photoresist topcoat compositions and methods of processing photoresist compositions2019 10,167,411Neutral layer polymers, methods of manufacture thereof and articles comprising the same2019 10,162,265Pattern treatment methods2018 10,133,179Pattern treatment methods2018 10,114,288Silicon-containing underlayers2018 10,042,259Topcoat compositions and pattern-forming methods2018 10,042,255Block copolymers and pattern treatment compositions and methods2018 10,031,420Wet-strippable silicon-containing antireflectant2018 10,007,179Thermal acid generators and photoresist pattern trimming compositions and methods2018 10,007,184Silicon-containing underlayers2018 9,880,469'Resins for underlayers'2018 9,809,672'Aromatic resins for underlayers'2017 9,802,400'Orientation control layer formed on a free top surface of a first block copolymer from a mixture of first and second block copolymers'2017 9,735,023'Methods for manufacturing block copolymer compositions and articles manufactured therefrom'2017 9,720,321'Lactone photoacid generators and resins and photoresists comprising same'2017 9,703,203'Compositions and methods for pattern treatment'2017 9,684,241'Compositions and methods for pattern treatment'2017 9,671,689'Cholate photoacid generators and photoresists comprising same'2017 9,671,697'Pattern treatment methods'2017 9,663,682'Methods for manufacturing block copolymers and articles manufactured therefrom'2017 9,665,005'Pattern treatment methods'2017 9,601,325'Aromatic resins for underlayers'2017 9,558,987'Gap-fill methods'2017 9,540,476'Aromatic resins for underlayers'2017 9,511,475'Polishing device for removing polishing byproducts'2016 9,507,259'Photoresist composition'2016 9,508,549'Methods of forming electronic devices including filling porous features with a polymer'2016 9,442,377'Wet-strippable silicon-containing antireflectant'2016 9,436,082'Compositions comprising base-reactive component and processes for photolithography'2016 9,406,527'Semiconductor device manufacturing method and related semiconductor wafer'2016 9,382,444'Neutral layer polymers, methods of manufacture thereof and articles comprising the same'2016 9,348,220'Photoacid generators and photoresists comprising same'2016 9,255,079'Photoacid generators and photoresists comprising same'2016 9,209,067'Gap-fill methods'2015 9,196,697'Semiconductor device with an aluminum alloy gate'2015 9,156,785'Base reactive photoacid generators and photoresists comprising same'2015 9,146,470'Photoacid generator and photoresist comprising same'2015 9,128,372'Dendritic compounds, photoresist compositions and methods of making electronic devices'2015 9,110,369'Photoacid generator, photoresist, coated substrate, and method of forming an electronic device'2015 9,045,506'Diphosphonate compound and a method for preparing the same and an application of the same'2015 9,046,767'Photoacid generator, photoresist, coated substrate, and method of forming an electronic device'2015 9,029,065'Photoacid generating compound and photoresist composition comprising same, coated article comprising the photoresist and method of making an article'2015 8,956,799'Photoacid generator and photoresist comprising same'2015 8,900,794'Photoacid generator and photoresist comprising same'2014 8,858,817'Polishing apparatus and exception handling method thereof'2014 8,851,959'Chemical mechanical polishing device and polishing element'2014 8,846,535'Method of fabricating a semiconductor device'2014 8,815,728'Semiconductor device having metal alloy gate and method for manufacturing the same'2014 8,808,063'Method for removing polishing byproducts and polishing device'2014 8,790,861'Cycloaliphatic monomer, polymer comprising the same, and photoresist composition comprising the polymer'2014 8,777,026'Crane jib transition structure'2014 8,758,090'Polishing method and polishing device'2014 8,748,279'Method of manufacturing a semiconductor device'2014 8,721,401'Method for cleaning a polishing pad'2014 8,603,728'Polymer composition and photoresist comprising the polymer'2013 8,541,308'Polishing method and method for forming a gate'2013 8,507,336'Method for forming metal gate and MOS transistor'2013 8,338,077'Photoacid generators and photoresists comprising same'2012 8,313,991'Method for fabricating a high-K metal gate MOS'2012 6,842,937'Rain-gutter cleaning tool set'2005

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2005–2020Patents assigned to LI MINGQI (24)· patent assignee history

2012–2020Patents assigned to ROHM & HAAS ELECT MAT (51)· patent assignee history

2012–2014Patents assigned to JIANG LI (10)· patent assignee history

2012–2020Patents assigned to LIU CONG (9)· patent assignee history

2012–2020Based in Shrewsbury, MA, US· patent location history

2012–2016Based in Shanghai, CN· patent location history

2014Based in Beijing, CN· patent location history

2015–2019Patents assigned to DOW GLOBAL TECHNOLOGIES LLC (16)· patent assignee history

2016–2020Based in Marlborough, MA, US· patent location history

2021Based in Shenzhen, CN· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
ROHM & HAAS ELECT MAT	51	2012–2020
LI MINGQIself	24	2005–2020
DOW GLOBAL TECHNOLOGIES LLC	16	2015–2019
JIANG LI	10	2012–2014
LIU CONG	9	2012–2020

Locations

Location	Patents	Span
Shrewsbury, Massachusetts, US	48	2012–2020
Shanghai, CN	13	2012–2016
Marlborough, Massachusetts, US	4	2016–2020
Shenzhen, CN	3	2021
Beijing, CN	2	2014