Inventor
Yao Zhi Hu
Inventor
San Jose, CA, US
Overview
Patents· 15 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1046%
F27BFurnaces, kilns, ovens or retorts in general11%
H10DInorganic electric semiconductor devices11%
G01KMeasuring temperature7%
H05BElectric heating7%
C30BSingle-crystal growth4%
F26BDrying solid materials or objects by removing liquid therefrom4%
G01BMeasuring length, thickness or similar linear dimensions4%
G01NInvestigating or analysing materials by determining their chemical or physical properties4%
H01LSemiconductor devices4%
PatentTitleYear
9,633,876'Selective reflectivity process chamber with customized wavelength response and method'20177,977,258'Method and system for thermally processing a plurality of wafer-shaped objects'20117,737,385'Selective reflectivity process chamber with customized wavelength response and method'20107,151,060'Device and method for thermally treating semiconductor wafers'20067,115,837'Selective reflectivity process chamber with customized wavelength response and method'20066,706,643'UV-enhanced oxy-nitridation of semiconductor substrates'20046,707,011'Rapid thermal processing system for integrated circuits'20046,600,138'Rapid thermal processing system for integrated circuits'20036,451,713'UV pretreatment process for ultra-thin oxynitride formation'20026,403,923'System for controlling the temperature of a reflective substrate during rapid heating'20026,359,263'System for controlling the temperature of a reflective substrate during rapid heating'20026,204,484'System for measuring the temperature of a semiconductor wafer during thermal processing'20016,200,023'Method for determining the temperature in a thermal processing chamber'20016,075,922'Process for preventing gas leaks in an atmospheric thermal processing chamber'20005,624,190'Method and apparatus for measuring the temperature of an object, in particular a semiconductor, by ellipsometry'1997Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1997Based in Chapel Hill, NC, US· patent location history
2000–2002Patents assigned to STEAG RTP SYSTEMS INC (4)· patent assignee history
2000–2017Based in San Jose, CA, US· patent location history
2002–2017Patents assigned to MATTSON TECH INC (9)· patent assignee history
2017Patents assigned to BORDIGA PETER C (1)· patent assignee history
2017Patents assigned to DEVINE DANIEL J (1)· patent assignee history
2017Patents assigned to HU YAO ZHI (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MATTSON TECH INC | 9 | 2002–2017 |
| STEAG RTP SYSTEMS INC | 4 | 2000–2002 |
| BORDIGA PETER C | 1 | 2017 |
| DEVINE DANIEL J | 1 | 2017 |
| HU YAO ZHIself | 1 | 2017 |
Locations
| Location | Patents | Span |
|---|---|---|
| San Jose, California, US | 14 | 2000–2017 |
| Chapel Hill, NC, US | 1 | 1997 |