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Inventor

HIROMITSU NAKASHIMA

Inventor
JP

Overview

3→
Patents
2023–2026
Patent span
Chemistry
Primary field (CPC C)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C08Lprimary
C08LCompositions of macromolecular compounds20%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices20%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds13%
C09DCoating compositions, e.g. paints, varnishes or lacquers13%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
C07CAcyclic or carbocyclic compounds7%
C07DHeterocyclic compounds7%
H01LSemiconductor devices7%
PatentTitleYear
12,560,866Radiation-sensitive resin composition, method of forming resist pattern, polymer, and compound202611,681,222Fluorine-containing polymer, purification method, and radiation-sensitive resin composition202311,603,459Resin composition and method of forming resist pattern2023

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2023–2026Patents assigned to JSR CORP (3)· patent assignee history
2023–2026Based in JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
JSR CORP32023–2026
Locations
LocationPatentsSpan
JP32023–2026