Inventor

Takashi Onozawa

Inventor
Ibaraki, JP

Overview

8→
Patents
1993–2012
Patent span
Chemistry
Primary field (CPC C)

Patents· 8 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C07Cprimary
C07CAcyclic or carbocyclic compounds37%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry16%
C07DHeterocyclic compounds16%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests16%
C12NMicroorganisms or enzymes5%
C22BProduction and refining of metals5%
Y02PClimate change mitigation technologies in the production or processing of goods5%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1993Based in Shizuoka, JP· patent location history
1997–2003Patents assigned to MITSUBISHI GAS CHEMICAL CO (6)· patent assignee history
1997–2001Based in Ibaraki, JP· patent location history
2003Based in Mie, JP· patent location history
2012Patents assigned to DNP FINE CHEMICALS FUKUSHIMA CO LTD (1)· patent assignee history
2012Patents assigned to IKEDA SHIN (1)· patent assignee history
2012Patents assigned to ONOZAWA TAKASHI (1)· patent assignee history
2012Patents assigned to OOYAMA TETSUYA (1)· patent assignee history
2012Based in Minamisouma, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
MITSUBISHI GAS CHEMICAL CO61997–2003
DNP FINE CHEMICALS FUKUSHIMA CO LTD12012
IKEDA SHIN12012
ONOZAWA TAKASHIself12012
OOYAMA TETSUYA12012
Locations
LocationPatentsSpan
Ibaraki, JP51997–2001
Minamisouma, JP12012
Mie, JP12003
Shizuoka, JP11993