Inventor
Sherman K. Poultney
Inventor
Wilton, CT, US
Overview
Patents· 20 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light24%
G02BOptical elements, systems or apparatus14%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1010%
H01JElectric discharge tubes or discharge lamps5%
B41CProcesses for the manufacture or reproduction of printing surfaces2%
G01BMeasuring length, thickness or similar linear dimensions2%
G01CMeasuring distances, levels or bearings2%
G01NInvestigating or analysing materials by determining their chemical or physical properties2%
G06FElectric digital data processing2%
PatentTitleYear
7,768,653'Method and system for wavefront measurements of an optical system'20107,602,503'Methods for measuring a wavefront of an optical system'20097,595,931'Grating for EUV lithographic system aberration measurement'20097,580,559'System and method for calibrating a spatial light modulator'20097,469,058'Method and system for a maskless lithography rasterization technique based on global optimization'20087,268,891'Transmission shear grating in checkerboard configuration for EUV wavefront sensor'20077,158,238'System and method for calibrating a spatial light modulator array using shearing interferometry'20077,113,255'Grating patch arrangement, lithographic apparatus, method of testing, device manufacturing method, and device manufactured thereby'20067,102,733'System and method to compensate for static and dynamic misalignments and deformations in a maskless lithography tool'20066,965,436'System and method for calibrating a spatial light modulator array using shearing interferometry'20056,867,846'Tailored reflecting diffractor for EUV lithographic system aberration measurement'20056,847,461'System and method for calibrating a spatial light modulator array using shearing interferometry'20055,610,102'Method for co-registering semiconductor wafers undergoing work in one or more blind process modules'19975,563,709'Apparatus for measuring, thinning and flattening silicon structures'19965,474,647'Wafer flow architecture for production wafer processing'19955,312,510'Apparatus for optimally scanning a two-dimensional surface of one or more objects'19945,282,921'Apparatus and method for optimally scanning a two-dimensional surface of one or more objects'19944,729,658'Very wide spectral coverage grating spectrometer'19884,724,326'Off-chip time-delayed integration area array Fraunhofer line discriminator'19884,433,245'Fraunhofer line discriminator'1984Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1984–1988Patents assigned to PERKIN ELMER CORP (3)· patent assignee history
1984–2010Based in Wilton, CT, US· patent location history
1994–1995Patents assigned to HUGHES AIRCRAFT CO (3)· patent assignee history
1994–1997Based in Ridgefield, CT, US· patent location history
1996–1997Patents assigned to INTEGRATED PROCESS EQUIPMENT C (2)· patent assignee history
2005–2010Patents assigned to ASML HOLDING NV (11)· patent assignee history
2009Patents assigned to ASML HOLDINGS N V (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML HOLDING NV | 11 | 2005–2010 |
| HUGHES AIRCRAFT CO | 3 | 1994–1995 |
| PERKIN ELMER CORP | 3 | 1984–1988 |
| INTEGRATED PROCESS EQUIPMENT C | 2 | 1996–1997 |
| ASML HOLDINGS N V | 1 | 2009 |
Locations
| Location | Patents | Span |
|---|---|---|
| Wilton, CT, US | 16 | 1984–2010 |
| Ridgefield, CT, US | 4 | 1994–1997 |