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Inventor

Gentaro Nagamatsu

Inventor
Tokyo, JP

Overview

3→
Patents
1978–1984
Patent span
Physics
Primary field (CPC G)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices67%
G03GElectrography33%
PatentTitleYear
4,444,858'Method of preparing a lithographic printing plate'19844,279,984'Positive resist for high energy radiation'19814,121,936'Positive resist for high energy radiation'1978

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1978–1981Patents assigned to MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (2)· patent assignee history
1978–1984Based in Tokyo, JP· patent location history
1984Patents assigned to FUJI CHEM IND CO LTD (1)· patent assignee history
1984Patents assigned to UNIV TOKAI (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD21978–1981
FUJI CHEM IND CO LTD11984
UNIV TOKAI11984
Locations
LocationPatentsSpan
Tokyo, JP31978–1984