Inventor
Kaori Inoshima
Inventor
Toyama, JP
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1045%
C23CCoating metallic material18%
G05BControl or regulating systems in general18%
G06FElectric digital data processing9%
H01LSemiconductor devices9%
PatentTitleYear
10,131,992Substrate processing apparatus, method of controlling substrate processing apparatus, method of maintaining substrate processing apparatus, and recording medium201810,096,501Maintenance method of substrate processing apparatus, method for manufacturing semiconductor device, substrate processing apparatus, and storage medium capable of reading maintenance program of substrate processing apparatus20189,690,879'Substrate processing apparatus, method of manufacturing semiconductor device, and method of generating recipe'20178,482,426'Substrate processing apparatus'20137,808,396'Substrate processing apparatus'2010Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2010–2018Patents assigned to HITACHI INT ELECTRIC INC (5)· patent assignee history
2010–2018Based in Toyama, JP· patent location history
2013Patents assigned to IIDA TSUKASA (1)· patent assignee history
2013Patents assigned to INOSHIMA KAORI (1)· patent assignee history
2013Patents assigned to YONEDA AKIHIKO (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI INT ELECTRIC INC | 5 | 2010–2018 |
| IIDA TSUKASA | 1 | 2013 |
| INOSHIMA KAORIself | 1 | 2013 |
| YONEDA AKIHIKO | 1 | 2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Toyama, JP | 5 | 2010–2018 |