Inventor

Makoto Momota

Inventor

Shizuoka, JP

Overview

1996–2019

Patent span

Physics

Primary field (CPC G)

Patents· 14 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices55%

G03GElectrography10%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests10%

C04BLime, magnesia5%

C07CAcyclic or carbocyclic compounds5%

C11DDetergent compositions5%

H01GCapacitors5%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h105%

PatentTitleYear

10,276,303Dielectric composition and multilayer electronic device2019 10,126,651Pattern forming method, and, method for producing electronic device and electronic device, each using the same2018 7,338,740'Positive resist composition'2008 7,279,265'Positive resist composition and pattern formation method using the same'2007 7,022,456'Positive photoresist composition'2006 6,808,869'Bottom anti-reflective coating material composition and method for forming resist pattern using the same'2004 6,399,269'Bottom anti-reflective coating material composition for photoresist and method of forming resist pattern using the same'2002 6,165,684'Bottom anti-reflective coating material composition and method for forming resist pattern using the same'2000 5,853,949'Method of synthesizing polyphenol compound and positive working photoresist composition comprising polyphenol compound'1998 5,750,310'Positive photoresist composition'1998 5,747,218'Positive photoresist composition'1998 5,667,932'Positive photoresist composition'1997 5,601,958'Method for preparation of printing plate by electrophotographic process'1997 5,589,308'Method for preparation of printing plate by electrophotographic process'1996

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1996–2006Patents assigned to FUJI PHOTO FILM CO LTD (10)· patent assignee history

1996–2008Based in Shizuoka, JP· patent location history

2007–2018Patents assigned to FUJIFILM CORP (3)· patent assignee history

2018Based in Haibara-gun, JP· patent location history

2019Patents assigned to TDK CORP (1)· patent assignee history

2019Based in Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
FUJI PHOTO FILM CO LTD	10	1996–2006
FUJIFILM CORP	3	2007–2018
TDK CORP	1	2019

Locations

Location	Patents	Span
Shizuoka, JP	12	1996–2008
Tokyo, JP	1	2019
Haibara-gun, JP	1	2018