LexDanaLexDanabeta
Inventor

MIR HOMAYOUN SHAHRJERDY

Inventor
NL

Overview

3→
Patents
2021–2025
Patent span
Physics
Primary field (CPC G)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices43%
G06TImage data processing or generation, in general43%
G06KGraphical data reading14%
PatentTitleYear
12,468,235Method and apparatus to determine a patterning process parameter202511,947,269Method and apparatus to determine a patterning process parameter202411,143,972Method and apparatus to determine a patterning process parameter2021

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2021–2025Patents assigned to ASML NETHERLANDS BV (3)· patent assignee history
2021–2025Based in NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV32021–2025
Locations
LocationPatentsSpan
NL32021–2025