Inventor
Jaehwa Park
Inventor
Suwon-si, KR
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1030%
H10DInorganic electric semiconductor devices20%
C09KMaterials for miscellaneous applications, not provided for elsewhere10%
H01LSemiconductor devices10%
LOC1410%
Y02CCapture, storage, sequestration or disposal of greenhouse gases [ghg]10%
Y02PClimate change mitigation technologies in the production or processing of goods10%
PatentTitleYear
11,081,361Plasma etching method2021D0924882Television receiver20217,939,401'Dual gate structure, fabrication method for the same, semiconductor device having the same, and semiconductor device fabrication method'20117,635,897'Dual gate structure, fabrication method for the same, semiconductor device having the same'2009Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2009–2021Patents assigned to SAMSUNG ELECTRONICS CO LTD (3)· patent assignee history
2009–2011Based in Gyeonggi-do, KR· patent location history
2021Patents assigned to UNIV AJOU IND ACADEMIC COOP FOUND (1)· patent assignee history
2021Based in Suwon-si, KR· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SAMSUNG ELECTRONICS CO LTD | 3 | 2009–2021 |
| UNIV AJOU IND ACADEMIC COOP FOUND | 1 | 2021 |
Locations
| Location | Patents | Span |
|---|---|---|
| Suwon-si, KR | 2 | 2021 |
| Gyeonggi-do, KR | 2 | 2009–2011 |