Inventor
Hiromi Itoh
Inventor
Hyogo, JP
Overview
Patents· 18 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material27%
H10BElectronic memory devices23%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests17%
H10DInorganic electric semiconductor devices13%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
C30BSingle-crystal growth3%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h103%
PatentTitleYear
7,510,984'Method of forming silicon nitride film and method of manufacturing semiconductor device'20096,746,876'Capacitor manufacturing method having dielectric formed before electrode'20045,972,748'Semiconductor memory device and method of manufacturing the same'19995,753,527'Method of manufacturing a semiconductor memory device'19985,693,553'Semiconductor device and manufacturing method of the same'19975,572,052'Electronic device using zirconate titanate and barium titanate ferroelectrics in insulating layer'19965,567,964'Semiconductor device'19965,519,237'Semiconductor memory device'19965,470,799'Method for pretreating semiconductor substrate by photochemically removing native oxide'19955,429,991'Method of forming thin film for semiconductor device'19955,407,867'Method of forming a thin film on surface of semiconductor substrate'19955,382,817'Semiconductor device having a ferroelectric capacitor with a planarized lower electrode'19955,240,505'Method of an apparatus for forming thin film for semiconductor device'19935,174,881'Apparatus for forming a thin film on surface of semiconductor substrate'19925,070,815'MOCVD device for growing a semiconductor layer by the metal-organic chemical vapor deposition process'19914,883,020'Apparatus of metal organic chemical vapor deposition for growing epitaxial layer of compound semiconductor'19894,839,196'Photochemical film-forming method'19894,732,793'Method and apparatus for laser-induced CVD'1988Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1988–1999Patents assigned to MITSUBISHI ELECTRIC CORP (13)· patent assignee history
1988–1999Based in Hyogo, JP· patent location history
1989–1991Patents assigned to FUJITSU LTD (2)· patent assignee history
1989Based in Kawasaki, JP· patent location history
1991Based in Sagamihara, JP· patent location history
1995Patents assigned to MITSUBISHKI DENKI KABUSHIKI KA (1)· patent assignee history
2004Patents assigned to RENESAS TECH CORP (1)· patent assignee history
2004Based in Tokyo, JP· patent location history
2009Patents assigned to ULVAC INC (1)· patent assignee history
2009Based in Kanagawa, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MITSUBISHI ELECTRIC CORP | 13 | 1988–1999 |
| FUJITSU LTD | 2 | 1989–1991 |
| MITSUBISHKI DENKI KABUSHIKI KA | 1 | 1995 |
| RENESAS TECH CORP | 1 | 2004 |
| ULVAC INC | 1 | 2009 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hyogo, JP | 13 | 1988–1999 |
| Kanagawa, JP | 1 | 2009 |
| Tokyo, JP | 1 | 2004 |
| Sagamihara, JP | 1 | 1991 |
| Kawasaki, JP | 1 | 1989 |