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Inventor

Stephan Schittny

Inventor
Alzenau, DE

Overview

3→
Patents
1989–2000
Patent span
Chemistry
Primary field (CPC C)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary
C23CCoating metallic material43%
C22CAlloys29%
B22FWorking metallic powder14%
H01JElectric discharge tubes or discharge lamps14%
PatentTitleYear
6,030,514'Method of reducing sputtering burn-in time, minimizing sputtered particulate, and target assembly therefor'20005,112,468'Target for magnetron-sputtering systems'19924,803,046'Method for making targets'1989

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1989Patents assigned to DEMETRON (1)· patent assignee history
1989–1992Based in Alzenau, DE· patent location history
1992Patents assigned to DEGUSSA (1)· patent assignee history
2000Patents assigned to MATERIALS RESEARCH CORP (1)· patent assignee history
2000Patents assigned to SONY CORP (1)· patent assignee history
2000Based in Phoenix, AZ, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
DEGUSSA11992
DEMETRON11989
MATERIALS RESEARCH CORP12000
SONY CORP12000
Locations
LocationPatentsSpan
Alzenau, DE21989–1992
Phoenix, AZ, US12000