Inventor

Dai Onishi

Inventor
Kyoto, JP

Overview

8→
Patents
2009–2019
Patent span
Electricity
Primary field (CPC H)

Patents· 8 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Sprimary
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light31%
G02BOptical elements, systems or apparatus23%
H01QAntennas, i.e. radio aerials15%
B21DWorking or processing of sheet metal or metal tubes, rods or profiles without essentially removing material8%
B30BPresses in general8%
B82YSpecific uses or applications of nanostructures8%
G05BControl or regulating systems in general8%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2009–2019Patents assigned to ROHM CO LTD (6)· patent assignee history
2009–2019Based in Kyoto, JP· patent location history
2012–2013Patents assigned to IHI CORP (2)· patent assignee history
2012–2013Patents assigned to ONISHI DAI (2)· patent assignee history
2012Patents assigned to FUJITA YUTAKA (1)· patent assignee history
2012–2013Based in Tokyo, JP· patent location history
2015–2017Patents assigned to UNIV OSAKA (3)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ROHM CO LTD62009–2019
UNIV OSAKA32015–2017
IHI CORP22012–2013
ONISHI DAIself22012–2013
FUJITA YUTAKA12012
Locations
LocationPatentsSpan
Kyoto, JP62009–2019
Tokyo, JP22012–2013