Inventor
Rikita Tsunoda
Inventor
Kawasaki, JP
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices38%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1023%
H01LSemiconductor devices15%
C07CAcyclic or carbocyclic compounds8%
C07DHeterocyclic compounds8%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds8%
PatentTitleYear
10,429,740Method of recovering resist pattern20199,696,625'Method of forming resist pattern'20179,618,845'Method for forming resist pattern, resist pattern splitting agent, split pattern improving agent, resist pattern splitting material, and positive resist composition for forming split pattern'20179,581,909'Method of trimming resist pattern'20179,459,528'Negative tone resist composition for solvent developing and method of forming resist pattern'2016Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2016–2019Patents assigned to TOKYO OHKA KOGYO CO LTD (5)· patent assignee history
2016–2019Based in Kawasaki, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO OHKA KOGYO CO LTD | 5 | 2016–2019 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kawasaki, JP | 5 | 2016–2019 |