Inventor
Isao Mita
Inventor
Kumamoto, JP
Overview
Patents· 3 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices43%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1029%
H01LSemiconductor devices14%
Y10TTechnical subjects covered by former us classification14%
PatentTitleYear
9,304,399'Resist composition and method for producing semiconductor device'20168,765,353'Resist composition and method for producing semiconductor device'20148,697,342'Method of modifying chemically amplified resist pattern, modifier for chemically amplified resist pattern, and resist pattern structure'2014Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2014–2016Patents assigned to SONY CORP (3)· patent assignee history
2014Patents assigned to MATSUZAWA NOBUYUKI (2)· patent assignee history
2014Patents assigned to MITA ISAO (2)· patent assignee history
2014Patents assigned to ARIMITSU KOJI (1)· patent assignee history
2014Patents assigned to MATSUI ERIKO (1)· patent assignee history
2014–2016Based in Kumamoto, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SONY CORP | 3 | 2014–2016 |
| MATSUZAWA NOBUYUKI | 2 | 2014 |
| MITA ISAOself | 2 | 2014 |
| ARIMITSU KOJI | 1 | 2014 |
| MATSUI ERIKO | 1 | 2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kumamoto, JP | 3 | 2014–2016 |