Inventor
Ralf Zweering
Inventor
Aalen, DE
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
G02BOptical elements, systems or apparatus38%
G21KHandling of particles or ionising radiation not otherwise provided for13%
PatentTitleYear
11,048,177Projection exposure apparatus for semiconductor lithography with improved component adjustment and adjustment method202110,809,636Optical arrangement, in particular lithography system202010,761,436Optical arrangement, in particular lithography system, with a transport lock202010,168,619Optical device for a lithography apparatus, and lithography apparatus2019Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2019–2021Patents assigned to ZEISS CARL SMT GMBH (4)· patent assignee history
2019–2021Based in Aalen, DE· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ZEISS CARL SMT GMBH | 4 | 2019–2021 |
Locations
| Location | Patents | Span |
|---|---|---|
| Aalen, DE | 4 | 2019–2021 |