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Inventor

Wu Hung Ko

Inventor
Tainan, TW

Overview

3→
Patents
2006–2017
Patent span
Physics
Primary field (CPC G)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices100%
PatentTitleYear
9,726,990'Lithography mask repair methods'20178,703,364'Method for repairing photomask'20147,097,948'Method for repair of photomasks'2006

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2006–2014Patents assigned to TAIWAN SEMICONDUCTOR MFG (2)· patent assignee history
2006Based in Kaohsiung, TW· patent location history
2014Patents assigned to HSIEH KUN-LUNG (1)· patent assignee history
2014Patents assigned to KO WU HUNG (1)· patent assignee history
2014Patents assigned to LIN CHUNG-HUNG (1)· patent assignee history
2014Based in Hsinchu, TW· patent location history
2017Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (1)· patent assignee history
2017Based in Tainan, TW· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TAIWAN SEMICONDUCTOR MFG22006–2014
HSIEH KUN-LUNG12014
KO WU HUNGself12014
LIN CHUNG-HUNG12014
TAIWAN SEMICONDUCTOR MFG CO LTD12017
Locations
LocationPatentsSpan
Tainan, TW12017
Hsinchu, TW12014
Kaohsiung, TW12006