Inventor
Takayuki Katano
Inventor
Nirasaki, JP
Overview
Patents· 12 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1038%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices25%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests13%
B05CApparatus for applying fluent materials to surfaces, in general6%
F24FAir-conditioning6%
B01DSeparation3%
B05BSpraying apparatus3%
Y02PClimate change mitigation technologies in the production or processing of goods3%
Y10TTechnical subjects covered by former us classification3%
PatentTitleYear
7,401,988'Substrate processing apparatus and substrate processing method'20087,208,066'Substrate processing apparatus and substrate processing method'20076,617,095'Evaluating method of hydrophobic process, forming method of resist pattern, and forming system of resist pattern'20036,485,203'Substrate processing method and substrate processing apparatus'20026,333,003'Treatment apparatus, treatment method, and impurity removing apparatus'20016,097,469'Method of processing resist onto substrate and resist processing apparatus'20006,063,439'Processing apparatus and method using solution'20006,017,663'Method of processing resist utilizing alkaline component monitoring'20005,944,894'Substrate treatment system'19995,932,380'Method of processing resist utilizing alkaline component monitoring'19995,928,390'Vertical processing apparatus'19995,876,280'Substrate treating system and substrate treating method'1999Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1999–2008Patents assigned to TOKYO ELECTRON LTD (12)· patent assignee history
1999–2007Based in Nirasaki, JP· patent location history
2000Based in Yamanashi, JP· patent location history
2008Based in Kai, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 12 | 1999–2008 |
Locations
| Location | Patents | Span |
|---|---|---|
| Nirasaki, JP | 10 | 1999–2007 |
| Kai, JP | 1 | 2008 |
| Yamanashi, JP | 1 | 2000 |