Inventor
Koichiro Moriyama
Inventor
Kyoto, JP
Overview
Patents· 16 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material23%
Y02PClimate change mitigation technologies in the production or processing of goods17%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation15%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution15%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1012%
H01JElectric discharge tubes or discharge lamps6%
G21KHandling of particles or ionising radiation not otherwise provided for4%
C30BSingle-crystal growth2%
H05HPlasma technique2%
H10DInorganic electric semiconductor devices2%
PatentTitleYear
7,534,628'Method for forming semiconductor device and method for forming photovoltaic device'20097,211,708'Exhaust processing method, plasma processing method and plasma processing apparatus'20077,074,641'Method of forming silicon-based thin film, silicon-based thin film, and photovoltaic element'20066,858,087'Vacuum-processing method using a movable cooling plate during processing'20056,833,155'Apparatus and method for processing a substrate'20046,794,275'Process for forming a silicon-based film on a substrate using a temperature gradient across the substrate axis'20046,667,240'Method and apparatus for forming deposited film'20036,602,347'Apparatus and method for processing a substrate'20036,576,061'Apparatus and method for processing a substrate'20036,547,922'Vacuum-processing apparatus using a movable cooling plate during processing'20036,447,612'Film-forming apparatus for forming a deposited film on a substrate, and vacuum-processing apparatus and method for vacuum-processing an object'20026,350,489'Deposited-film forming process and deposited-film forming apparatus'20026,338,872'Film forming method'20026,273,955'Film forming apparatus'20016,261,862'Process for producing photovoltaic element'20016,031,198'Plasma processing method and apparatus'2000Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2000–2009Patents assigned to CANON KK (16)· patent assignee history
2000–2005Based in Kyotanabe, JP· patent location history
2001–2007Based in Kyoto, JP· patent location history
2009Based in Kobe, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| CANON KK | 16 | 2000–2009 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kyoto, JP | 8 | 2001–2007 |
| Kyotanabe, JP | 7 | 2000–2005 |
| Kobe, JP | 1 | 2009 |