Inventor

Yukihiko Takeuchi

Inventor
Osaka, JP

Overview

6→
Patents
1997–2009
Patent span
Mechanical engineering
Primary field (CPC F)

Patents· 6 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices23%
F02MSupplying combustion engines in general with combustible mixtures or constituents thereof15%
C11DDetergent compositions8%
F02DControlling combustion engines8%
F16KValves8%
G02BOptical elements, systems or apparatus8%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation8%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h108%
Y10TTechnical subjects covered by former us classification8%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1997Patents assigned to NIPPON DENSO CO (1)· patent assignee history
1997–2001Based in Handa, JP· patent location history
2001–2009Patents assigned to DENSO CORP (2)· patent assignee history
2002–2004Patents assigned to MITSUBISHI GAS CHEMICAL CO (3)· patent assignee history
2002–2004Patents assigned to SHARP KK (3)· patent assignee history
2002–2004Based in Osaka, JP· patent location history
2002Based in Mie, JP· patent location history
2009Based in Nishikamo-gun, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
MITSUBISHI GAS CHEMICAL CO32002–2004
SHARP KK32002–2004
DENSO CORP22001–2009
NIPPON DENSO CO11997
Locations
LocationPatentsSpan
Osaka, JP22002–2004
Handa, JP21997–2001
Nishikamo-gun, JP12009
Mie, JP12002