Inventor
Yukihiko Takeuchi
Inventor
Osaka, JP
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices23%
F02MSupplying combustion engines in general with combustible mixtures or constituents thereof15%
C11DDetergent compositions8%
F02DControlling combustion engines8%
F16KValves8%
G02BOptical elements, systems or apparatus8%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation8%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h108%
Y10TTechnical subjects covered by former us classification8%
PatentTitleYear
7,532,404'Optical device having micro lens array'20096,815,150'Photoresist stripping composition and process for stripping resist'20046,500,270'Resist film removing composition and method for manufacturing thin film circuit element using the composition'20026,458,517'Photoresist stripping composition and process for stripping photoresist'20026,289,929'Pressure control valve for fuel tank'20015,632,258'Exhaust gas recirculation control apparatus for an internal combustion engine'1997Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1997Patents assigned to NIPPON DENSO CO (1)· patent assignee history
1997–2001Based in Handa, JP· patent location history
2001–2009Patents assigned to DENSO CORP (2)· patent assignee history
2002–2004Patents assigned to MITSUBISHI GAS CHEMICAL CO (3)· patent assignee history
2002–2004Patents assigned to SHARP KK (3)· patent assignee history
2002–2004Based in Osaka, JP· patent location history
2002Based in Mie, JP· patent location history
2009Based in Nishikamo-gun, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MITSUBISHI GAS CHEMICAL CO | 3 | 2002–2004 |
| SHARP KK | 3 | 2002–2004 |
| DENSO CORP | 2 | 2001–2009 |
| NIPPON DENSO CO | 1 | 1997 |
Locations
| Location | Patents | Span |
|---|---|---|
| Osaka, JP | 2 | 2002–2004 |
| Handa, JP | 2 | 1997–2001 |
| Nishikamo-gun, JP | 1 | 2009 |
| Mie, JP | 1 | 2002 |