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Inventor

Tsuyoshi Murai

Inventor
Tokyo, JP

Overview

4→
Patents
1993–2013
Patent span
Performing operations
Primary field (CPC B)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1027%
B08BCleaning in general18%
B24BMachines, devices, or processes for grinding or polishing18%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry9%
B02CCrushing, pulverising, or disintegrating in general9%
C01BNon-metallic elements9%
H01JElectric discharge tubes or discharge lamps9%
PatentTitleYear
8,353,472'Raw silicon crusher'20135,795,401'Method for scrubbing substrate'19985,465,447'Apparatus for scrubbing substrate'19955,270,250'Method of fabricating semiconductor substrate having very shallow impurity diffusion layer'1993

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1993–1998Patents assigned to SETEK M KK (3)· patent assignee history
1993–2013Based in Tokyo, JP· patent location history
2013Patents assigned to KONAKA TOSHINORI (1)· patent assignee history
2013Patents assigned to MURAI TSUYOSHI (1)· patent assignee history
2013Patents assigned to TEOSS CO LTD (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SETEK M KK31993–1998
KONAKA TOSHINORI12013
MURAI TSUYOSHIself12013
TEOSS CO LTD12013
Locations
LocationPatentsSpan
Tokyo, JP41993–2013