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Inventor

Atsushi Kumano

Inventor
Tokyo, JP

Overview

23→
Patents
1987–2019
Patent span
Physics
Primary field (CPC G)

Patents· 23 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices21%
G02BOptical elements, systems or apparatus17%
H05KPrinted circuits7%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests7%
Y10TTechnical subjects covered by former us classification7%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds4%
C08LCompositions of macromolecular compounds4%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein4%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h104%
B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form3%
PatentTitleYear
10,477,084Manufacturing method for camera module20199,197,803'Camera module'20158,477,267'Light-condensing film, liquid-crystal panel and backlight as well as manufacturing process for light-condensing film'20137,852,435'Light-condensing film, liquid-crystal panel and backlight as well as manufacturing process for light-condensing film'20107,378,224'Method for forming pattern, and optical element'20087,320,854'Radiation sensitive refractive index changing composition, pattern forming method and optical material'20087,205,085'Composition having permitivity being radiation-sensitively changeable and method for forming permitivity pattern'20077,125,647'Radiation-sensitive composition changing in refractive index and utilization thereof'20067,108,954'Radiation-sensitive composition changing in refractive index and method of changing refractive index'20067,071,255'Radiation-sensitive composition capable of having refractive index distribution'20066,828,078'Composition having refractive index sensitively changeable by radiation and method for forming refractive index pattern'20046,815,046'Method of producing ceramic multilayer substrate'20046,787,289'Radiation sensitive refractive index changing composition and refractive index changing method'20046,770,780'Vinylphenylpropionic acid derivatives, production process therefor, polymer thereof and radiation sensitive resin composition'20046,432,239'Method of producing ceramic multilayer substrate'20026,368,774'Radiation sensitive composition'20026,348,298'Radiation sensitive composition'20026,255,034'Radiation sensitive composition'20016,140,019'Radiation sensitive composition'20006,087,050'Radiation sensitive composition and color filter'20006,051,368'Radiation sensitive composition containing a dispersed phosphor'20006,046,121'Glass paste composition'20004,683,280'Radiation curable composition'1987

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2000–2013Patents assigned to JSR CORP (18)· patent assignee history
2000–2002Based in Mie, JP· patent location history
2000–2002Based in Yokkaichi, JP· patent location history
2002–2019Patents assigned to MURATA MANUFACTURING CO (4)· patent assignee history
2002–2004Based in Shiga, JP· patent location history
2004–2013Based in Tokyo, JP· patent location history
2010–2013Patents assigned to DAINIPPON INK & CHEMICALS (2)· patent assignee history
2010–2013Patents assigned to DAINIPPON PRINTING CO LTD (2)· patent assignee history
2010–2013Patents assigned to KONICA MINOLTA HOLDINGS INC (2)· patent assignee history
2015–2019Based in Nagaokakyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
JSR CORP182000–2013
MURATA MANUFACTURING CO42002–2019
DAINIPPON INK & CHEMICALS22010–2013
DAINIPPON PRINTING CO LTD22010–2013
KONICA MINOLTA HOLDINGS INC22010–2013
Locations
LocationPatentsSpan
Tokyo, JP112004–2013
Mie, JP52000–2002
Nagaokakyo, JP22015–2019
Shiga, JP22002–2004
Yokkaichi, JP22000–2002