Inventor
Amir Widmann
Inventor
Sunnyvale, CA, US
Overview
Patents· 18 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices31%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1027%
H01LSemiconductor devices9%
G01NInvestigating or analysing materials by determining their chemical or physical properties7%
G05BControl or regulating systems in general7%
G06FElectric digital data processing4%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h104%
B08BCleaning in general2%
G01BMeasuring length, thickness or similar linear dimensions2%
G06TImage data processing or generation, in general2%
PatentTitleYear
10,649,447Methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers20209,651,943'Methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers'20179,576,861'Method and system for universal target based inspection and metrology'20179,558,978'Material handling with dedicated automated material handling system'20179,329,033'Method for estimating and correcting misregistration target inaccuracy'20169,170,209'Inspection guided overlay metrology'20159,116,442'Feedforward/feedback litho process control of stress and overlay'20158,948,495'Inspecting a wafer and/or predicting one or more characteristics of a device being formed on a wafer'20158,804,137'Unique mark and method to determine critical dimension uniformity and registration of reticles combined with wafer overlay capability'20148,655,469'Advanced process control optimization'20148,559,001'Inspection guided overlay metrology'20138,175,831'Methods and systems for creating or performing a dynamic sampling scheme for a process during which measurements are performed on wafers'20128,111,376'Feedforward/feedback litho process control of stress and overlay'20128,045,786'Waferless recipe optimization'20117,925,486'Computer-implemented methods, carrier media, and systems for creating a metrology target structure design for a reticle layout'20117,679,069'Method and system for optimizing alignment performance in a fleet of exposure tools'20107,561,282'Techniques for determining overlay and critical dimension using a single metrology tool'20096,864,458'Iced film substrate cleaning'2005Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2005–2017Based in Haifa, IL· patent location history
2009–2011Patents assigned to KLA TENCOR TECH CORP (4)· patent assignee history
2009–2020Based in Sunnyvale, CA, US· patent location history
2012–2020Patents assigned to KLA TENCOR CORP (13)· patent assignee history
2012–2017Patents assigned to WIDMANN AMIR (8)· patent assignee history
2012–2017Patents assigned to CHOI DONGSUB (6)· patent assignee history
2012–2017Patents assigned to ROBINSON JOHN (5)· patent assignee history
2013–2016Based in D.N. Hof HaCarmel, IL· patent location history
2015Based in Doar Na, IL· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| KLA TENCOR CORP | 13 | 2012–2020 |
| WIDMANN AMIRself | 8 | 2012–2017 |
| CHOI DONGSUB | 6 | 2012–2017 |
| ROBINSON JOHN | 5 | 2012–2017 |
| KLA TENCOR TECH CORP | 4 | 2009–2011 |
Locations
| Location | Patents | Span |
|---|---|---|
| Sunnyvale, California, US | 13 | 2009–2020 |
| Haifa, IL | 2 | 2005–2017 |
| D.N. Hof HaCarmel, IL | 2 | 2013–2016 |
| Doar Na, IL | 1 | 2015 |