Inventor

Go Nakajima

Inventor

Tokyo, JP

Overview

2021

Patent span

Performing operations

Primary field (CPC B)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B01Lprimary

B01LChemical or physical laboratory apparatus for general use25%

B05CApparatus for applying fluent materials to surfaces, in general25%

B29CShaping or joining of plastics25%

G01NInvestigating or analysing materials by determining their chemical or physical properties25%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2021Patents assigned to HITACHI HIGH TECH CORP (1)· patent assignee history

2021Based in Tokyo, JP· patent location history

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
HITACHI HIGH TECH CORP	1	2021

Locations

Location	Patents	Span
Tokyo, JP	1	2021