Inventor

Thomas Hubsch

Inventor
Koln, DE

Overview

4→
Patents
1998–2004
Patent span
Chemistry
Primary field (CPC C)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Cprimary
G03CPhotosensitive materials for photographic purposes50%
C07CAcyclic or carbocyclic compounds25%
C07DHeterocyclic compounds13%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium13%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1998–1999Patents assigned to AGFA GEVAERT AG (2)· patent assignee history
1998Based in Leverkusen, DE· patent location history
1999–2001Based in Koln, DE· patent location history
2001–2004Patents assigned to AGFA GEVAERT (2)· patent assignee history
2004Based in Kln, DE· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
AGFA GEVAERT22001–2004
AGFA GEVAERT AG21998–1999
Locations
LocationPatentsSpan
Koln, DE21999–2001
Kln, DE12004
Leverkusen, DE11998