Inventor
Takehiro Seshimo
Inventor
Kawasaki, JP
Overview
Patents· 39 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices24%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests11%
C09DCoating compositions, e.g. paints, varnishes or lacquers9%
C07CAcyclic or carbocyclic compounds7%
C07DHeterocyclic compounds7%
B82YSpecific uses or applications of nanostructures5%
B05DProcesses for applying fluent materials to surfaces, in general5%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems5%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h104%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds3%
PatentTitleYear
10,941,253Block copolymer, and method of producing structure containing phase-separated structure202110,366,888Pattern forming method201910,317,797Pattern forming method for forming a pattern201910,179,866Resin composition for forming a phase-separated structure, and method of producing structure containing phase-separated structure201910,167,410Using chemical vapor deposited films to control domain orientation in block copolymer thin films20199,914,847'Resin composition for forming a phase-separated structure, and method of producing structure containing phase-separated structure'20189,850,350Block copolymer, method of producing block copolymer, and method of producing structure containing phase-separated structure20179,828,519Resin composition for forming a phase-separated structure, and method of producing structure containing phase-separated structure20179,644,110'Method of producing structure containing phase-separated structure and method of forming top coat film'20179,567,477'Undercoat agent and method of producing structure containing phase-separated structure'20179,442,371'Method of producing structure containing phase-separated structure, method of forming pattern and method of forming fine pattern'20169,314,819'Anhydride copolymer top coats for orientation control of thin film block copolymers'20169,206,307'Method of producing structure containing phase-separated structure, method of forming pattern and method of forming fine pattern'20159,188,869'Method of producing structure containing phase-separation structure, method of forming pattern, and method of forming fine pattern'20159,169,421'Method of producing structure containing phase-separated structure, method of forming pattern, and top coat material'20159,157,008'Anhydride copolymer top coats for orientation control of thin film block copolymers'20159,040,121'Using chemical vapor deposited films to control domain orientation in block copolymer thin films'20159,012,129'Resist composition, method of forming resist pattern, novel compound, and acid generator'20158,932,795'Resist composition, method of forming resist pattern, novel compound, and acid generator'20158,808,959'Resist composition, method of forming resist pattern, novel compound, and acid generator'20148,765,352'Resist composition, method of forming resist pattern, novel compound, and acid generator'20148,609,320'Resist composition, method of forming resist pattern, polymeric compound and compound'20138,415,082'Resist composition, method of forming resist pattern, compound and method of producing the same, acid generator'20138,415,085'Resist composition, method of forming resist pattern, novel compound, and acid generator'20138,367,299'Resist composition, method of forming resist pattern, compound and acid generator'20138,338,076'Resist composition, method of forming resist pattern, novel compound, and acid generator'20128,298,748'Positive resist composition, method of forming resist pattern, and polymeric compound'20128,252,509'Resist composition and method of forming resist pattern'20128,206,891'Positive resist composition and method of forming resist pattern'20128,206,890'Resist composition, method of forming resist pattern, compound and acid generator'20128,124,313'Resist composition, method of forming resist pattern, novel compound, and acid generator'20128,007,981'Resist composition and method of forming resist pattern'20117,955,777'Compound, acid generator, resist composition and method of forming resist pattern'20117,927,780'Resist composition, method of forming resist pattern, novel compound and method of producing the same, and acid generator'20117,776,510'Resist composition, method of forming resist pattern, compound and acid generator'20107,745,097'Compound, manufacturing method thereof, acid generator, resist composition and method of forming resist pattern'20107,713,679'Resist composition, method of forming resist pattern, novel compound, and acid generator'20107,682,772'Resist composition, method of forming resist pattern, novel compound, and acid generator'20107,488,568'Resist composition, method of forming resist pattern, compound and acid generator'2009Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2009–2021Patents assigned to TOKYO OHKA KOGYO CO LTD (35)· patent assignee history
2009–2021Based in Kawasaki, JP· patent location history
2012–2015Patents assigned to SESHIMO TAKEHIRO (13)· patent assignee history
2012–2015Patents assigned to UTSUMI YOSHIYUKI (13)· patent assignee history
2012–2014Patents assigned to KAWAUE AKIYA (7)· patent assignee history
2012–2014Patents assigned to HADA HIDEO (6)· patent assignee history
2015–2019Based in Austin, TX, US· patent location history
2019Based in Kanagawa, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO OHKA KOGYO CO LTD | 35 | 2009–2021 |
| SESHIMO TAKEHIROself | 13 | 2012–2015 |
| UTSUMI YOSHIYUKI | 13 | 2012–2015 |
| KAWAUE AKIYA | 7 | 2012–2014 |
| HADA HIDEO | 6 | 2012–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kawasaki, JP | 33 | 2009–2021 |
| Austin, Texas, US | 4 | 2015–2019 |
| Kanagawa, JP | 2 | 2019 |