Inventor
Masakazu Shimada
Inventor
Toyama, JP
Overview
Patents· 23 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1034%
C23CCoating metallic material19%
G02BOptical elements, systems or apparatus9%
H01LSemiconductor devices9%
F27BFurnaces, kilns, ovens or retorts in general4%
H05BElectric heating4%
LOC134%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests4%
Y10TTechnical subjects covered by former us classification4%
C07DHeterocyclic compounds2%
PatentTitleYear
10,876,207Substrate processing apparatus, liquid precursor replenishment system, and method of manufacturing semiconductor device20209,437,421'Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium'20169,184,069'Heating apparatus, substrate processing apparatus employing the same, method of manufacturing semiconductor devices, and insulator'20158,876,453'Substrate processing apparatus and method of manufacturing semiconductor device'20148,507,296'Substrate processing method and film forming method'20138,501,599'Substrate processing apparatus and substrate processing method'20138,303,712'Substrate processing apparatus, method for manufacturing semiconductor device, and process tube'20128,158,911'Heating apparatus, substrate processing apparatus employing the same, method of manufacturing semiconductor devices, and extending member'20128,148,271'Substrate processing apparatus, coolant gas supply nozzle and semiconductor device manufacturing method'20128,116,618'Heating apparatus, substrate processing apparatus, and method of manufacturing semiconductor devices'2012D0652395'Semiconductor manufacturing equipment'2012D0651990'Semiconductor manufacturing equipment'20128,030,599'Substrate processing apparatus, heating device, and semiconductor device manufacturing method'20117,863,204'Substrate processing apparatus, heating apparatus for use in the same, method of manufacturing semiconductors with those apparatuses, and heating element supporting structure'20117,700,054'Substrate processing apparatus having gas side flow via gas inlet'20106,563,634'Microscope with aberration correcting function'20036,043,475'Focal point adjustment apparatus and method applied to microscopes'20006,034,815'Laser scan microscope'20006,025,956'Incident-light fluorescence microscope'20005,879,415'Semiconductor fabricating apparatus, method for controlling oxygen concentration within load-lock chamber and method for generating native oxide'19995,735,961'Semiconductor fabricating apparatus, method for controlling oxygen concentration within load-lock chamber and method for generating native oxide'19985,516,436'Agent for treating textile materials'19965,277,215'Method for supplying and discharging gas to and from semiconductor manufacturing equipment and system for executing the same'1994Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1994–2000Based in Tokyo, JP· patent location history
1996Based in Fukui, JP· patent location history
2000–2003Patents assigned to OLYMPUS OPTICAL CO (4)· patent assignee history
2000Based in Hachioji, JP· patent location history
2003Based in Nishinomiya, JP· patent location history
2010–2016Patents assigned to HITACHI INT ELECTRIC INC (14)· patent assignee history
2010–2020Based in Toyama, JP· patent location history
2012–2015Patents assigned to SHIMADA MASAKAZU (10)· patent assignee history
2012–2015Patents assigned to HAYASHIDA AKIRA (6)· patent assignee history
2012–2015Patents assigned to UENO MASAAKI (6)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI INT ELECTRIC INC | 14 | 2010–2016 |
| SHIMADA MASAKAZUself | 10 | 2012–2015 |
| HAYASHIDA AKIRA | 6 | 2012–2015 |
| UENO MASAAKI | 6 | 2012–2015 |
| OLYMPUS OPTICAL CO | 4 | 2000–2003 |
Locations
| Location | Patents | Span |
|---|---|---|
| Toyama, JP | 15 | 2010–2020 |
| Tokyo, JP | 4 | 1994–2000 |
| Hachioji, JP | 2 | 2000 |
| Nishinomiya, JP | 1 | 2003 |
| Fukui, JP | 1 | 1996 |