Inventor

HISAO M. CHANG

Inventor
US

Overview

2→
Patents
2022–2023
Patent span
Mechanical engineering
Primary field (CPC F)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

F24Fprimary
F24FAir-conditioning50%
G10LSpeech analysis techniques or speech synthesis50%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2022–2023Patents assigned to HONEYWELL INT INC (2)· patent assignee history
2022–2023Based in US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
HONEYWELL INT INC22022–2023
Locations
LocationPatentsSpan
US22022–2023