Inventor
Jinchun Hu
Inventor
Beijing, CN
Overview
Patents· 20 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices29%
G01BMeasuring length, thickness or similar linear dimensions21%
G01DMeasuring not specially adapted for a specific variable16%
G05BControl or regulating systems in general5%
H02NElectric machines not otherwise provided for5%
A61MDevices for introducing media into, or onto, the body3%
B64GCosmonautics3%
F16FSprings3%
G01MTesting static or dynamic balance of machines or structures3%
G02BOptical elements, systems or apparatus3%
PatentTitleYear
11,103,685Hollow microneedle arrays202110,532,832Magnetic levitation reaction sphere20209,995,569Six-degree-of-freedom displacement measurement method for exposure region on silicon wafer stage20189,903,704'Three-DOF heterodyne grating interferometer displacement measurement system'20189,904,183'Coarse motion and fine motion integrated reticle stage driven by planar motor'20189,885,556'Dual-frequency grating interferometer displacement measurement system'20189,879,979'Heterodyne grating interferometer displacement measurement system'20189,869,857'Optical grating phase modulator for laser interference photoetching system'20189,791,789'Magnetically suspended coarse motion and fine motion integrated reticle stage driven by planar motor'20179,766,054'Planar motor rotor displacement measuring device and its measuring method'20179,752,643'Negative stiffness system for gravity compensation of micropositioner'20179,455,650'Two-dimensional locating method of motion platform based on magnetic steel array'20169,310,782'Method for measuring displacement of planar motor rotor'20169,310,797'Single degree of freedom vibration isolating device of linear motor and motion control method thereof'20169,182,217'Method for measuring displacement of large-range moving platform'20159,030,648'Dual wafer stage exchanging system for lithographic device'20158,958,078'Two-dimensional, position-sensitive sensor-based system for positioning object having six degrees of freedom in space'20158,860,927'Dual-stage exchange system for lithographic apparatus'20148,836,918'Dual-stage exchange system for lithographic apparatus'20148,599,361'Nanometer-precision six-degree-of-freedom magnetic suspension micro-motion table and application thereof'2013Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2013–2020Patents assigned to UNIV TSINGHUA (19)· patent assignee history
2013–2016Patents assigned to HU JINCHUN (6)· patent assignee history
2013–2016Patents assigned to YIN WENSHENG (6)· patent assignee history
2013–2016Patents assigned to ZHANG MING (6)· patent assignee history
2013–2016Patents assigned to ZHU YU (6)· patent assignee history
2013–2020Based in Beijing, CN· patent location history
2021Based in Mounds View, MN, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| UNIV TSINGHUA | 19 | 2013–2020 |
| HU JINCHUNself | 6 | 2013–2016 |
| YIN WENSHENG | 6 | 2013–2016 |
| ZHANG MING | 6 | 2013–2016 |
| ZHU YU | 6 | 2013–2016 |
Locations
| Location | Patents | Span |
|---|---|---|
| Beijing, CN | 19 | 2013–2020 |
| Mounds View, Minnesota, US | 1 | 2021 |