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Inventor

Shingo Takasugi

Inventor
Tokyo, JP

Overview

1→
Patents
2017
Patent span
Chemistry
Primary field (CPC C)

Patents· 1 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C07Cprimary
C07CAcyclic or carbocyclic compounds20%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds20%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices20%
H01LSemiconductor devices20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
PatentTitleYear
9,581,905'Composition for film formation, resist underlayer film and forming method thereof, pattern-forming method and compound'2017

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2017Patents assigned to JSR CORP (1)· patent assignee history
2017Based in Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
JSR CORP12017
Locations
LocationPatentsSpan
Tokyo, JP12017