LexDanaLexDanabeta
Inventor

Jung-Chih Kuo

Inventor
Taichung, TW

Overview

4→
Patents
2005–2011
Patent span
Physics
Primary field (CPC G)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices75%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them25%
PatentTitleYear
7,933,015'Mark for alignment and overlay, mask having the same, and method of using the same'20117,056,631'Exposure system and method with group compensation'20067,046,332'Exposure system and method with group compensation'20066,873,399'Exposure system and method'2005

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2005–2011Patents assigned to NANYA TECHNOLOGY CORP (4)· patent assignee history
2005–2006Based in Taichung, TW· patent location history
2011Based in Taoyuan, TW· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
NANYA TECHNOLOGY CORP42005–2011
Locations
LocationPatentsSpan
Taichung, TW32005–2006
Taoyuan, TW12011