Inventor

David B. Wurm

Inventor

Pearland, TX, US

Overview

2013–2020

Patent span

Chemistry

Primary field (CPC C)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

A61Kprimary

A61KPreparations for medical, dental or toiletry purposes15%

A61QSpecific use of cosmetics or similar toiletry preparations15%

B24BMachines, devices, or processes for grinding or polishing8%

B28DWorking stone or stone-like materials8%

C07CAcyclic or carbocyclic compounds8%

C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds8%

C10MLubricating compositions8%

C10NIndexing scheme associated with subclass c10m relating to lubricating compositions8%

C11DDetergent compositions8%

G06QInformation and communication technology [ict] specially adapted for administrative, commercial, financial, managerial or supervisory purposes8%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2013–2015Patents assigned to DOW GLOBAL TECHNOLOGIES LLC (2)· patent assignee history

2013Patents assigned to DOW BRASIL SUDESTE IND LTDA (1)· patent assignee history

2013–2015Based in Pearland, TX, US· patent location history

2015Patents assigned to AGUILAR DANIEL A (1)· patent assignee history

2015Patents assigned to LI FANG (1)· patent assignee history

2016–2020Patents assigned to SEKISUI SPECIALTY CHEMICALS AM (2)· patent assignee history

2016Based in Houston, TX, US· patent location history

2020Based in Manvel, TX, US· patent location history

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
DOW GLOBAL TECHNOLOGIES LLC	2	2013–2015
SEKISUI SPECIALTY CHEMICALS AM	2	2016–2020
AGUILAR DANIEL A	1	2015
DOW BRASIL SUDESTE IND LTDA	1	2013
LI FANG	1	2015

Locations