LexDanaLexDanabeta
Inventor

JU HYOUNG PARK

Inventor
KR

Overview

22→
Patents
2021–2023
Patent span
Electricity
Primary field (CPC H)

Patents· 22 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Qprimary
H01QAntennas, i.e. radio aerials85%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1012%
H01LSemiconductor devices4%
PatentTitleYear
11,855,355Antenna apparatus202311,721,913Chip antenna module202311,646,503Antenna apparatus202311,646,496Antenna apparatus and antenna module202311,646,504Chip antenna module array202311,588,222Chip antenna module array and chip antenna module202311,437,723Antenna apparatus202211,431,107Chip antenna module and method of manufacturing chip antenna module202211,417,959Chip antenna module and electronic device202211,349,215Antenna apparatus and antenna module202211,336,022Antenna apparatus202211,322,857Chip antenna module array202211,316,272Antenna apparatus202211,296,421Antenna module and electronic device including antenna module202211,264,703Chip antenna202211,251,518Chip antenna202211,245,201Antenna apparatus202211,245,192Chip antenna202211,233,337Antenna apparatus202211,233,336Chip antenna and chip antenna module including the same202211,211,709Antenna apparatus and antenna module202111,158,928Chip antenna module2021

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2021–2023Patents assigned to SAMSUNG ELECTRO MECH (22)· patent assignee history
2021–2023Based in KR· patent location history
2022–2023Patents assigned to SEOUL NAT UNIV R&DB FOUNDATION (4)· patent assignee history
2022Patents assigned to SEOUL NATIONAL UNIV R&BD FOUNDATION (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SAMSUNG ELECTRO MECH222021–2023
SEOUL NAT UNIV R&DB FOUNDATION42022–2023
SEOUL NATIONAL UNIV R&BD FOUNDATION12022
Locations
LocationPatentsSpan
KR222021–2023