Inventor
Shich-Chang Suen
Inventor
Hsinchu, TW
Overview
Patents· 24 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1022%
H01LSemiconductor devices20%
H10DInorganic electric semiconductor devices17%
B24BMachines, devices, or processes for grinding or polishing14%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1014%
B24DTools for grinding, buffing or sharpening5%
H10KOrganic electric solid-state devices2%
B08BCleaning in general1%
C01BNon-metallic elements1%
C01GCompounds containing metals not covered by subclasses c01d or c01f1%
PatentTitleYear
11,117,239Chemical mechanical polishing composition and method202111,024,540Fin field-effect transistor device and method of forming the same202110,967,478Chemical mechanical polishing apparatus and method202110,847,359Method for metal gate surface clean202010,755,934Systems and methods for chemical mechanical polish and clean202010,515,808Systems and methods for chemical mechanical polish and clean201910,504,782Fin Field-Effect Transistor device and method of forming the same201910,164,053Semiconductor device and method201810,160,088Advanced polishing system20189,987,720Method for operating a polishing head and method for polishing a substrate20189,917,173'Oxidation and etching post metal gate CMP'20189,802,292'Advanced polishing system'20179,630,295'Mechanisms for removing debris from polishing pad'20179,633,832'Method for metal gate surface clean'20179,564,511'Oxidation and etching post metal gate CMP'20179,553,161'Mechanism for forming metal gate structure'20179,449,841'Methods and systems for chemical mechanical polish and clean'20169,352,443'Platen assembly, chemical-mechanical polisher, and method for polishing substrate'20169,272,386'Polishing head, and chemical-mechanical polishing system for polishing substrate'20169,269,585'Method for cleaning metal gate surface'20169,209,272'Oxidation and etching post metal gate CMP'20159,076,766'Mechanism for forming metal gate structure'20158,703,612'Process for forming contact plugs'20146,139,816'Process for the preparation of ultra-fine powders of metal oxides'2000Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2000Patents assigned to MERCK KANTO ADVANCED CHEMICAL (1)· patent assignee history
2000Based in Pingtung County, TW· patent location history
2014–2016Patents assigned to TAIWAN SEMICONDUCTOR MFG (3)· patent assignee history
2014Patents assigned to CHEN LIANG-GUANG (1)· patent assignee history
2014Patents assigned to JENG SHWANG-MING (1)· patent assignee history
2014–2021Based in Hsinchu, TW· patent location history
2015–2021Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (20)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TAIWAN SEMICONDUCTOR MFG CO LTD | 20 | 2015–2021 |
| TAIWAN SEMICONDUCTOR MFG | 3 | 2014–2016 |
| CHEN LIANG-GUANG | 1 | 2014 |
| JENG SHWANG-MING | 1 | 2014 |
| MERCK KANTO ADVANCED CHEMICAL | 1 | 2000 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hsinchu, TW | 23 | 2014–2021 |
| Pingtung County, TW | 1 | 2000 |