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Inventor

Pei Wei Yeh

Inventor
Tainan, TW

Overview

2→
Patents
2001–2003
Patent span
Performing operations
Primary field (CPC B)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B24Bprimary
B24BMachines, devices, or processes for grinding or polishing67%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
PatentTitleYear
6,582,288'Diaphragm for chemical mechanical polisher'20036,206,760'Method and apparatus for preventing particle contamination in a polishing machine'2001

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2001–2003Patents assigned to APPLIED MATERIALS INC (2)· patent assignee history
2001Patents assigned to TAIWAN SEMICONDUCTOR MFG (1)· patent assignee history
2001–2003Based in Tainan, TW· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
APPLIED MATERIALS INC22001–2003
TAIWAN SEMICONDUCTOR MFG12001
Locations
LocationPatentsSpan
Tainan, TW22001–2003