Inventor

Andreas Wurmbrand

Inventor
Aalen, DE

Overview

22→
Patents
2006–2018
Patent span
Physics
Primary field (CPC G)

Patents· 22 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices65%
G02BOptical elements, systems or apparatus35%
PatentTitleYear
9,996,015Mirror module, in particular for a microlithographic projection exposure appararatus20189,298,111'Optical arrangement in a projection exposure apparatus for EUV lithography'20169,182,679'Lithographic apparatus and device manufacturing method'20159,081,296'Replacement apparatus for an optical element'20158,902,519'Replacement apparatus for an optical element'20148,860,922'Lithographic apparatus and device manufacturing method'20148,854,602'Holding device for an optical element in an objective'20148,810,771'Lithographic apparatus and device manufacturing method'20148,582,081'Device for the low-deformation replaceable mounting of an optical element'20138,488,261'Replacement apparatus for an optical element'20138,339,576'Projection objective of a microlithographic projection exposure apparatus'20128,102,502'Lithographic apparatus and device manufacturing method'20127,995,296'Replacement apparatus for an optical element'20117,768,723'Replacement apparatus for an optical element'20107,649,702'Immersion lithography objective'20107,570,343'Microlithographic projection exposure apparatus'20097,532,304'Lithographic apparatus and device manufacturing method'20097,515,363'Replacement apparatus for an optical element'20097,471,469'Device for the low-deformation replaceable mounting of an optical element'20087,352,433'Lithographic apparatus and device manufacturing method'20087,265,917'Replacement apparatus for an optical element'20077,085,080'Low-deformation support device of an optical element'2006

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2006–2014Patents assigned to ZEISS CARL SMT AG (11)· patent assignee history
2006–2018Based in Aalen, DE· patent location history
2008–2015Patents assigned to ASML NETHERLANDS BV (8)· patent assignee history
2011–2018Patents assigned to ZEISS CARL SMT GMBH (10)· patent assignee history
2012–2016Patents assigned to WURMBRAND ANDREAS (8)· patent assignee history
2012–2016Patents assigned to GELLRICH BERNHARD (5)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ZEISS CARL SMT AG112006–2014
ZEISS CARL SMT GMBH102011–2018
ASML NETHERLANDS BV82008–2015
WURMBRAND ANDREASself82012–2016
GELLRICH BERNHARD52012–2016
Locations
LocationPatentsSpan
Aalen, DE222006–2018