Inventor
JIN SE PARK
Inventor
KR
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1031%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices15%
H01LSemiconductor devices15%
B08BCleaning in general8%
F16KValves8%
F16LPipes8%
F26BDrying solid materials or objects by removing liquid therefrom8%
G01NInvestigating or analysing materials by determining their chemical or physical properties8%
PatentTitleYear
12,546,534Substrate treating apparatus202612,480,595Anti freeze valve apparatus and semiconductor processing device including the same and manufacturing method thereof202512,057,335Apparatus for treating substrate and apparatus for measuring concentration202411,862,491Apparatus and method for treating substrate2024Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2024–2026Patents assigned to SEMES CO LTD (4)· patent assignee history
2024–2026Based in KR· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SEMES CO LTD | 4 | 2024–2026 |
Locations
| Location | Patents | Span |
|---|---|---|
| KR | 4 | 2024–2026 |